1stage 5 Shams ICCAS2013
1stage 5 Shams ICCAS2013
1stage 5 Shams ICCAS2013
IMC Based PI/D Controller Tuning Rule for Time Delay Processes
Mohammad Shamsuzzoha
Department of Chemical Engineering, King Fahd University of Petroleum and Minerals,
Dhahran, 31261, Saudi Arabia
(Tel : +966-3-860-7360; e-mail: [email protected])
Abstract: The motivation of this study is to obtain single tuning formula for different type of processes with enhanced
disturbance rejection performance. A simple tuning formula gives the consistently better performance as compared to
well-known SIMC method at the same degree of robustness for stable and integrating process. The performance of the
unstable process has been compared with other recently published method which also shows significant advantage in
the proposed method. For the selection of the closed-loop time constant, (c), a guideline is provided over a broad range
of time-delay/time-constant ratios on the basis of the peak of maximum uncertainty (Ms). Comparison of the IAE has
been conducted for wide range of / ratio for the first order time delay process. The proposed method gives better
performances for wide range of / ratio as compared to SIMC while Lee et al. shows poor disturbance rejection in lag
dominant process.
Keywords: PI/D controller, IMC method , stable process, unstable process
1. INTRODUCTION
Proportional integral (PI) controller has been the most
popular and widely used controllers in the process
industries because of their simplicity, robustness and
wide ranges of applicability with near-optimal
performance.
The stable and integrating processes are very
common in process industries in flow, level and
temperature loop. The open-loop unstable processes are
also encounter in chemical processing units and known
to be difficult to control, especially when there exists a
time delay, such as in the case of continuous stirred tank
reactors, polymerization reactors and bioreactors which
are inherently open-loop unstable by design.
On the basis of a survey of more than 11, 000
controllers in the process industries, Desborough and
Miller [1] reported that more than 97% of the regulatory
controllers utilize the PI algorithm. A recent survey of
Kano and Ogawa [2] shows that the ratios of
applications of different type of controller e.g., PI
control, conventional advanced control and model
predictive control is about 100:10:1. There is no perfect
alternative of the PID controller at least at the bottom
layer in the process industries. This was the clear
conclusion at the end of the IFAC Conference on
Advances in PID Control, held in Brescia (Italy) during
2830 March, 2012. Although the PI controller has only
two adjustable parameters, they are difficult to be tuned
properly in real process.
There are variety of controller tuning approach
reported in the literature and among that two types are
widely used for the controller tuning, one may use
open-loop or closed-loop plant tests. Most tuning
approaches are based on open-loop plant information;
(1)
G p p m p A
(2)
q
1 G p q
(8)
Substituting Eqs. (2) and (5) into (8) gives the ideal
feedback controller:
pm1
Gc
1
(im1 i s i 1)
( c s 1) r
p A im1 i s i 1
c s 1
(9)
s z1 , zm
d
u(t)
++
Process
y
Gp
setpoint
~
(3)
IMC
controller
Process model
is 1
( c s 1) r
m
i 1
Disturbance
setpoint
filter
fr
+-
pA ( im1 i s i 1)
( c s 1) r
sz
Gp
-+
(4)
,, zm
( im1 i s i 1)
( c s 1) r
(5)
m
si
i 1 i
c s 1
1 G p q G p 1 p A
d
1
r
(6)
fr
1
Gp
c s 1
m
si
i 1 i
(7)
4. SIMULATION STUDY
Ke - s
s 1
Gp
(10)
s 1
c s 1
(11)
s 1 s 1
2
K c s 1 - e- s s 1
(12)
Kc
K 2 c
; I
(13)
s1 0
obtained as
1 1
(14)
fr
cs 1
s 1
(15)
Process Variable
1.25
Process Variable
1.5
1
0.5
(a)
Proposed method
Yang et al.
5
10
Time
15
20
0.5
Proposed method
Yang et al.
0.4
Process Variable
25
0.3
0.2
0.1
(b) 0
0
10
Time
15
20
25
e 0.5 s
(C4).
5s 1 2s 1 0.5s 1
1
0.75
0.5
Proposed method
SIMC
Lee et al.
0.25
(a)
0
0
10
20
30
6
35
Proposed method
SIMC
Lee et al.
4
MV
Time
Proposed method
SIMC
Lee et al.
0.15
Process Variable
0
0
0.1
(a)
0.05
0
0
10
Time
0.5
15
Proposed method
SIMC
Lee et al.
(b)
10
Time
20
30
35
MV
0
0
20
-0.5
-1
(b)
-1.5
0
10
Time
15
20
(a)
0.8
Proposed method
SIMC
TL
0.4
0
0
40
80
Time
120
Process Variable
3.5
Proposed method without setpoint-filter (IAE=6.72, TV=11.98)
Proposed method with setpoint-filter (IAE=1.90, TV=2.26)
Proposed method
SIMC
TL
2.5
(b) 0
0
160
Process Variable
Process Variable
1.2
1.5
1
40
80
Time
120
160
0.5
0
0
Time
10
15
Table 1: PI/D controller setting for proposed method (F=1) and performance matrix.
Case
Process model
Methods
Resulting PI/PID-controller
c
C1
C2
C3
C4
e s
10 s 1
7.4 s
0.2e
s
0.5 s
e
s 1
0.5 s
5s 1 2s 1 0.5s 1
Ms
Kc
Setpoint
IAE (y)
Load
disturbance
IAE (y)
Proposed
2.46
1.60
4.57
4.85
3.1
1.06
SIMC
1.0
1.60
5.0
8.0
2.5
1.60
Lee et al.
1.0
1.60
5.12
10.25
2.17
2.0
Proposed
19.37 1.70
0.304
39.63
30.21
131.9
SIMC
7.4
1.70
0.338
59.2
28.8
174.5
TL
1.67
0.33
64.7
29.13
195
Proposed
1.36
6.0
1.646
8.25
6.72
5.01
Lee et al.
Proposed
1.4
2.9
6.0
2.2
1.668
3.22
8.67
9.50
6.77
6.37
5.20
2.95
Yang et al.
1.5
2.2
2.564
10.98
8.57
4.28
Note: For case C4: D =2.25 and 1.82 is used for the proposed and Yang et al., respectively.
5. DISCUSSIONS
c guideline for proposed tuning rule
4
c=
c=2
c=3
3
Ms
2
0
0
0.2
0.4
0.6
0.8
6. CONCLUSIONS
A simple analytical design method for PI/D controller
was proposed based on the IMC principle in order to
improve disturbance rejection performance. Another
important feature of the proposed methodology is that it
dealt stable, integrating and unstable process in a
unified way. As we have seen earlier a single tuning rule
gives satisfactory performance and robustness for all
cases.
In the resulting method c controls the tradeoff
between robustness and performance of the control
system. It is summarized as:
Kc
K 2 c F
1 1
I F;
D 2
Works Cited
[1] L. D. Desborough and R. M. Miller, "Increasing
customer value of industrial control performance
monitoringHoneywells
experience,"
in
Chemical Process Control VI AIChE Symposium
Series , Tuscon, Arizona, Jan. 2001, 2002.
[2] M. Kano and M. Ogawa, "The state of art in
chemical process control in Japan: Good practice
and questionnaire survey," Journal of Process
Control, vol. 20, pp. 969-982, 2010.
[3] D. Seborg, T. Edgar and D. Mellichamp, Process
Dynamics and Control, New York: Wiley, 2004.
[4] Y. Lee, S. Park, M. Lee and C. Brosilow, "PID