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X-Ray Photoelectron Spectroscopy Overview

X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject core electrons from a sample and measure their kinetic energy to determine the elemental composition and chemical states of the elements within the top 1-10 nm of the sample. The key components of an XPS system are an ultra-high vacuum system, X-ray source, electron analyzer, and ion gun. XPS is commonly used for failure analysis, studying polymer surfaces, corrosion analysis, adhesion studies, semiconductor analysis, dielectric materials analysis, and analyzing thin film coatings.

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0% found this document useful (0 votes)
143 views20 pages

X-Ray Photoelectron Spectroscopy Overview

X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique that uses X-rays to eject core electrons from a sample and measure their kinetic energy to determine the elemental composition and chemical states of the elements within the top 1-10 nm of the sample. The key components of an XPS system are an ultra-high vacuum system, X-ray source, electron analyzer, and ion gun. XPS is commonly used for failure analysis, studying polymer surfaces, corrosion analysis, adhesion studies, semiconductor analysis, dielectric materials analysis, and analyzing thin film coatings.

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X-RAY PHOTOELECTRON

SPECTROSCOPY (XPS)

Presented by:
Toshi Dhapodkar
Course: Ph. D. Sciences
Host Institute: CSIR-NPL
OUTLINE
▪ Introduction
▪ Basic Principle
▪ Instrumentation
▪ Applications
INTRODUCTION
▪ X-ray photoelectron spectroscopy (XPS) is a surface-sensitive,
quantitative spectroscopic technique based on the Photoelectric
Effect.
▪ X-ray Photoelectron Spectroscopy (XPS), also known as Electron
Spectroscopy for Chemical Analysis (ESCA), used to determine
quantitative atomic composition and chemistry.
▪ Based on the Einstein Photoelectric effect.
▪ A sample is irradiated with monochromatic x-rays, resulting in the
emission of photoelectrons whose energies are characteristic of the
elements within the sample.
▪ Core electrons with kinetic energy Ek are ejected by incident X-rays.
Basic components of a monochromatic XPS system.
XPS INSTRUMENTATION
▪Ultra-High Vacuum System
➢Allows longer photoelectron path length
➢Ultra-high vacuum keeps surfaces clean,
preventing the contaminations to produce
X-ray signal Pressure
➢Pressure < 10-8 Torr (Torr)
102
Low Vacuum
➢Vacuum pumps 10-1
Medium Vacuum
➢Roughing Pump 10-4
High Vacuum
➢Turbo Pump 10-8
Ultra-High Vacuum
➢Ion Pump 10-11
XPS INSTRUMENTATION Al Window
▪ X-ray source
➢Dual Anode X-ray source X-ray
➢Mg Kα radiation: hν = 1253.6 eV Filament Filament
Mg Al
➢Al Kα radiation: hν = 1486.6 eV Silver
Shield
substrate
➢Monochromated using quartz crystal
Anode
15 kV

Quartz crystal
Electron
source

X-ray
Electron beam
beam

X-ray Source XR 50
http://www.specs.de/cms/front_content.php?idcat=118
Al anode
Sample
XPS INSTRUMENTATION
▪ Electron analyzer
➢Lens system to collect photoelectrons
➢Analyzer to filter electron energies
➢Detector to count electrons

Hemispherical energy analyzer


Magnetic Shield

Lenses for
energy Detector
X-ray adjustment
source Lenses for
analysis
area definition
Analyzer control &
Sample computer system
XPS INSTRUMENTATION
▪Ion gun
➢Sample cleaning
➢Depth profiling
➢Ar+ is the most widely used ion

Electron analyzer
X-ray Ar+ gun
source

e-
e- e-
e-

Sample
APPLICATIONS IN THE INDUSTRY
▪ Failure analysis
▪ Polymer surface
▪ Corrosion
▪ Adhesion
▪ Semiconductors
▪ Dielectric materials
▪ Thin film coatings

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