CONFIDENTIAL MSE DESIGN STANDARD

CHEMRAZ®
(FFKM) Overview
Table of Contents

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GENERAL PURPOSE COMPOUNDS 3

RAPID GAS DECOMPRESSION RESISTANCE 6

AEROSPACE 6

HIGH TEMPERATURE 7

USP VI/FDA 8

WET APPLICATIONS 8

CLEAN-DEPOSITION/ETCH 9

CLEAN-DEPOSITION 9

CLEAN ETCH 10

LOW TEMPERATURE 11

BSV - DEPOSITION/ETCH 11

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Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
• Broad chemical • Acids
• Mechanical seals
compatibility for use • Caustics
• Valves
with wide range of • Aldehydes
• Pump housings
harsh solutions • Esters
• Sampling/metering
• Oil & Gas • Lower compression • Aromatics
equipment
• Chemical set increases ability -30°C to 230°C • Hot water/
504 • Reactors
Processing to handle temp & (-22°F to 446°F) steam
• Mixers
• Industrial pressure variations, • Amines
• Controls/
shaft misalignment, & • Methanol
instrumentation
o-ring shrinkage • Ketones
• Sprayers/dispensers
• Low temp capabilities • TBA
• Couplings
(-30°C/-22°F) • MTBE
• Acids
• Mechanical seals
• Caustics
• Valves • Broad chemical
• Aldehydes
• Pump housings compatibility for use
• Esters
• Reactors with a wide range of
• Ethers
• Oil & Gas • Compressors harsh solutions
• Aromatics
• Chemical • Sampling/metering • Lower compression -30°C to 230°C
505 • Hot water/
Processing equipment set increases ability (-22°F to 446°F)
steam
• Industrial • Mixers to handle temp and
General Purpose

• Amines
• Controls/ pressure variations,
• Methanol
instrumentation shaft misalignment, &
• Ketones
• Sprayers/dispensers o-ring shrinkage
• TBA
• Coupling
• MTBE
• Mechanical seals • Acids
• Valves • Caustics
• Pump housings • Broad chemical • Aldehydes
• Sampling/metering compatibility • Esters
• Oil & Gas equipment • Low temp capabilities • Aromatics
• Chemical • Reactors (-30°C/-22°F) -30°C to 230°C • Hot water/
510
Processing • Mixers • Higher hardness and (-22°F to 446°F) steam
• Industrial • Controls/ density reduces • Amines
instrumentation likelihood of gap • Methanol
• Sprayers/dispensers extrusion • Ketones
• Couplings • TBA
• Compressors • MTBE

Dry wafer processing • Good plasma

equipment seals: resistance
• Door seals • Good physical
• Slit valves properties
-30°C to 210°C
513 Semiconductor • Window seals • Minimal –
(-22°F to 410°F)
• Isolator valve seals contamination
• Lid seals • Excellent performance
• Gas inlet seals history as “universal
• KF fitting seals product”

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Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
• Mechanical seals
• Valves
• Oil & Gas • No carbon black
• Pump housings
• Chemical residue -30°C to 220°C
514 • Reactors –
Processing • Low-temp capabilities (-22°F to 428°F)
• Mixers
• Industrial (-30°C/-22°F)
• Sprayers/dispensers
• Couplings

• Excellent plasma
resistance
Dry wafer processing
• Outstanding
equipment seals:
physical properties
• Door seals
• Low contaminants
• Slit valves -30°C to 240°C
520 Semiconductor • Withstands higher –
• Isolator valve seals (-22°F to 464°F)
sealing loads
• Lid seals
General Purpose

• Excellent
• Gas inlet seals
performance
• KF fitting seals
history in higher temp
applications

Dry wafer processing

equipment seals:
• Good plasma resistance
• Door seals
• Good physical
• Slit valves
properties -30°C to 210°C
543 Semiconductor • Window seals –
• Minimal contamination (-22°F to 410°F)
• Isolator valve seals
• Excellent performance
• Lid seals
as a “universal product”
• Gas inlet seals
• KF fitting seals

• Good chemical
Aqueous wafer
resistance &
processing equipment
physical properties
seals:
• Used where
• Valve seals -30°C to 210°C
550 Semiconductor contamination –
• Fitting & union seals (-22°F to 410°F)
requirements are less
• Gaskets
critical
• Regulator seals
• Excellent
• Filter seals
performance history

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Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
• Broad chemical
compatibility
Aqueous wafer • High-temp capability
processing equipment • Excellent
and chemical/DI compression set
water distribution • Breadth of
system seals: capabilities allows
• Valve seals for standardization -12°C to 316°C
551 Semiconductor –
• Fitting and union on one material & (-10°F to 600°F)
seals reduces inventory line
• Gaskets items
• Regulator seals • Longer & better seal
• Filter seals integrity in seal
• Dispensing seals applications; lower
overall equipment cost
of operation

• Superior chemical
resistance for use
• Oil & Gas • Mechanical seals in strong oxidation
General Purpose

• Chemical • Sampling/metering fluids & hot aqueous -30°C to 220°C

584 –
Processing equipment solutions as well as (-22°F to 428°F)
• Industrial • Pump housings chlorine & ozone
• No carbon black
residue

Dry wafer processing

equipment seals:
• Excellent physical
• Slit valve seals
properties
• Lid seals
• Inert mineral filler
• Endpoint windows
system provides -30°C to 240°C
592 Semiconductor • Valve seals –
excellent resistance (-22°F to 464°F)
• Window seals
to plasma attack
• Isolator valve seals
• Good static &
• Gas inlet seals
dynamic performance
• Bell jar seals
• KF fitting seals

• High durometer &

high-density material
• Mechanical seals
helps withstand high
• Oil & Gas • Pump housings
pressure & harsh
• Chemical • Reactors -20°C to 260°C
600 environments –
Processing • Mixers (-4°F to 500°F)
• Broad chemical
• Industrial • Valves
resistance range
• Compressors
• High-temperature
capability

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Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
• Mechanical seals • Acids
• Pump housings • Caustics
General Purpose

• Reactors • Aldehydes
• High-temperature
• Mixers • Esters
capability
• Valves • Ethers
• Oil & Gas • Excellent compression
• Compressors • Aromatics
• Chemical set resistance -20°C to 260°C
605 • Sampling/metering • Hot water/
Processing • Broad chemical (-4°F to 500°F)
equipment steam
• Industrial compatibility for use with
• Controls/ • Amines
a wide range of harsh
instrumentation • Methanol
solutions
• Sprayers/dispensers • Ketones
• Diaphragms • TBA
• Couplings • MTBE

• Excellent RGD resistance

• Pumps
• Broad chemical resistance • Sour gas
• Oil & Gas • Mechanical seals
Rapid Gas Decompression Resistance

• Meets RGD requirements • Acids

• Chemical • Valves -20°C to 250°C
526 of Total GS EP PVV 142 & • Caustics
Processing • Downhole (-4°F to 482°F)
NACE TM0297 • Hot water/
• Industrial completion tools
• ISO 23936-2/ steam
• Compressors
NORSOK M-710

• Exceptional performance
• Deepwater drilling
in extreme low temps
• Oil & Gas tools
• Superior resistance to
• Chemical • Subsea equipment -40°C to 230°C
566 LT hostile reservoir –
Processing • Downhole completion (-40°F to 446°F)
chemistries
• Industrial tools used in water
• Excellent compression set
injection wells
& thermal shock resistance
• Excellent RGD resistance
• Exceptional performance
• Wireline tools in extreme low temps
• High pressure • Superior resistance to
• Oil & Gas applications hostile reservoir
• Chemical • Subsea chemistries, drilling fluid, -40°C to 230°C
678 –
Processing • Downhole production chemicals (-40°F to 446°F)
• Industrial Completion tools • Excellent compression set
• Downhole drilling & thermal shock resistance
tools • Meet RGD requirements
of ISO 23936-2/
NORSOK M-710

Perfluoroelastomer
Aerospace

Strong
(FFKM) compound
chemical
where ultra high-
-18°C to 324°C resistance to
676 Aerospace temperature &/or Meets AMS 7257E
(0°F to 615°F) all common
excellent chemical
Aerospace
compatibility is
fluids
required

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Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
• Mechanical seals • Acids
• Valves • Caustics
• Superior high
• Pump housings • Aldehydes
temp capability
• Sampling/meter- • Esters
(316°C/600°F)
ing equipment • Ethers
• Broad chemical
• Oil & Gas • Reactors • Aromatics
resistance in wide
• Chemical • Quick connect -12°C to 316°C • Hot water/steam
555 range of media
Processing couplings (10°F to 600°F) • Amines
• Excellent compression
• Industrial • Mixers • Methanol
set maintains seal
• Controls/ • Ketones
integrity in wide temp
instrumentation • Mixed process
& pressure variations
• Compressors streams
as well as vibration
• Sprayers/ • TBA
dispensers • MTBE
• Completion tools • Steam
• Oil & Gas • Electrical • Excellent compression • Reservoir
• Chemical submersible set resistance -12°C to 316°C fluids with
562
Processing pumps • Excellent steam (10°F to 600°F) high H2S
• Industrial • Mechanical & chemical resistance • Caustics
seals • Hot water/steam
High Temperature

• Mechanical seals
• Low compression set • Inorganic &
• Process control
at continuous temps organic
instruments
• Oil & Gas up to 324°C (615°F) chemicals
• Heat exchangers
• Chemical • Ability to handle -18°C to 324°C • Acids
615 • Valves
Processing severe thermal (0°F to 615°F) • Reagents
• Agitators &
• Industrial cycles • Heat transfer
mixers
• Excellent chemical fluids
• Pumps
resistance • Hydrocarbons
• Couplings
• Superior resistance
to hostile reservoir
chemistries, drilling
fluid, additives,
• Electrical & production • Inorganic
• Oil & Gas
submersible chemicals & organic
• Chemical -12°C to 316°C
694 pumps • Excellent compression chemicals
Processing (10°F to 600°F)
• Downhole set & thermal shock • Acids
• Industrial
completion tools resistance • Hydrocarbons
• Increased reliability of
components used in
critical steam & high-
temp environments
• Broad chemical
resistance to typical • Chlorine
Subfab applications
Subfab effluents • Fluorine
• Industrial including abatement -12°C to 300°C
SFX • Optimized physical • Hydrogen
• Semiconductor units, exhaust lines, (10°F to 572°F)
properties for long • Oxygen
pumps and valves
life in static vacuum
fittings

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Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
• No carbon black
residue
• Mechanical seals
• Low-temp capabilities
• Sampling/metering -30°C to 220°C
517 Life Science (-30°C/-22°F) –
equipment (-22°F to 428°F)
• 3-A® & FDA compliant,
• Pump housings
meeting the highest
purity standards
• Superior chemical
• Mechanical seals
resistance for use in
• Sampling/metering
strong oxidation fluids &
equipment
hot aqueous solutions
• Pump housings
as well as chlorine &
USP VI/FDA

• Reactors -30°C to 220°C

585 Life Science ozone –
• Mixers (-22°F to 428°F)
• No carbon black
• Valves
residue
• Controls/
• 3-A® & FDA compliant,
instrumentation
meeting the highest
• Couplings
purity standards
• Mechanical seals
• Valves
• Pumps • Superior
• Mixers fermenters high-temperature • Fuel
• Biomedical properties handling
equipment • Outstanding hot water -20°C to 260°C • CIP/SIP
625 Life Science
• Couplings & steam resistance (-4°F to 500°F) operations
• Filters • 3-A® & FDA compliant, • Pharmaceutical
• Dryers meeting the highest manufacturing
• Agitators purity standards
• Sanitary seals
• WFI gaskets
Aqueous wafer
processing equipment • Very low contaminants
seals: • Extended performance
• Valve seals & added reliability • Acids
-30°C to 210°C
570 Semiconductor • Fitting & union seals • Good physical • Solvents
Wet Applications

(-22°F to 410°F)
• Gaskets properties • Ultrapure H2O
• Regulator seals • Excellent performance
• Filter seals history
• Dispensing seals
Aqueous wafer
processing equipment • Very low contaminants
seals: • Extended performance
• Valve seals & added reliability • Acids
-30°C to 210°C
571 Semiconductor • Fitting & union seals • Good physical • Solvents
(-22°F to 410°F)
• Gaskets properties • Ultrapure H2O
• Regulator seals • Excellent performance
• Filter seals history
• Dispensing seals

8 BACK TO TABLE OF CONTENTS

Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
Dry wafer processing • Exceptional plasma
equipment seals: resistance in oxygen &
• Slit valve seals fluorine environments
• Lid seals • Minimal particulation &
• Endpoint windows surface degradation
-20°C to 260°C
Clean-Deposition/Etch

629 Semiconductor • Valve seals • High purity, very low –

(-4°F to 500°F)
• Window seals metallic ion content
• Isolator valve seals • High elasticity
• Gas inlet seals allows conformance to
• Bell jar seals hardware & easier seal
• KF fitting seals installation
Dry wafer processing
equipment seals:
• Endpoint windows
• Exceptional plasma
• Bell jar seals
resistance in oxygen &
• Valve seals
fluorine environments
• KF fitting seals -20°C to 260°C
639 Semiconductor • Minimal particulation & –
• Window seals (-4°F to 500°F)
surface degradation
• Isolator valve seals
• High purity, very low
• Lid seals
metallic ion content
• Gas inlet seals
• Slit valve seals
• Chamber seals
Dry wafer processing
equipment seals:
• Lid seals • Exceptional plasma
• Endpoint windows resistance in fluorine
• Gas inlet/outlet seals environments
• Chamber seals • Minimal particulation & Max service
547 Semiconductor • Valve seals surface degradation temperature: –
• Slit valve seals • High purity, very low 300°C (572°F)
• Isolation valve seals metallic ion content
Clean-Deposition

• Gasket seals • Excellent compression

• Dispersing seals set for repeated use
• Regulator seals
• Filler seals
• Outstanding plasma
NF3 plasma cleaning resistance in highly corrosive
equipment seals: fluorine environments with
• Chamber seals minimal seal degradation
• Endpoint windows • Excellent surface resistance
• Gas inlet/outlet seals for minimal particulation &
sealing integrity Max service
• Gate valve seals
XRZ Semiconductor • High purity for minimal temperature: –
• Isolator valve seals contamination risk 300°C (572°F)
• Reactant delivery • Minimal compression set
system seals at elevated temps ensures
• Reaction chamber seal integrity
lid seals • Extended equipment
• Slit valve seals uptime with added reliability
in dry applications

9 BACK TO TABLE OF CONTENTS

Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
Dry wafer processing
equipment seals:
• Excellent plasma
• Endpoint windows
resistance in a variety
• Bell jar seals
of aggressive chemical
• Valve seals
environments
• KF fitting seals -18°C to 324°C
657 Semiconductor • Minimal particulation –
• Window seals (0°F to 615°F)
• Withstands high service
• Isolator valve seals
temps up to 280°C
• Lid seals
(536°F) with excursions
• Gas Inlet seals
to 300°C (572°F)
• Slit valve seals
• Chamber seals
• Minimal contamination
• Withstands a variety of
Dry wafer processing
aggressive chemicals
equipment seals: -20°C to 260°C
E38 Semiconductor • Excellent physical –
• Bonded gate seals (-4°F to 500°F)
properties
• Chamber seals
• Low metal ion content
• Unlimited design flexibility
• High UV & ozone
Dry wafer processing
resistance enables next
equipment seals:
generation process
Clean Etch

• Chamber and slit

technology insertions
valve seals
• Superior O2 plasma
• Endpoint windows • O2 plasma
resistance results in
• Gas inlet/outlet Max service • Ozone
improved product
XPE-HP Semiconductor seals temperature: • Fluorine
integrity
• Gate and isolator 255°C (491°F) -based
• High-temp capability
valve seals plasmas
• Reduced erosion &
• Reactant delivery
particulation
system seals
• Decreased maintenance &
• Reaction chamber
replacement requirements
lid seals
• Excellent compression set

• High-temperature
Dry wafer processing capability enables future
equipment seals: technology & next
• Chamber & slit valve generation applications
seals • Superior O2 plasma
• Endpoint windows resistance resulting
• Gas inlet/outlet in improved product Max service Fluorine
XPE Semiconductor seals integrity temperature: -based
• Gate and isolator • High CF4 plasma resistance 280°C (536°F) plasmas
valve seals • Reduced product
• Reactant delivery weight loss
system seals • Decreased maintenance &
• Reaction chamber replacement requirements
lid seals • Excellent compression
set performance

10 BACK TO TABLE OF CONTENTS

Chemraz® (FFKM) Overview

Service
Chemraz®  Primary Suggested Features & Chemical
Temperature
Compound Industry Applications Benefits Compatibility
Range
Low Temperature

• Exceptional
• Deepwater drilling performance in
tools extreme low temps
• Oil & Gas
• Subsea equipment • Superior resistance
• Chemical -40°C to 230°C
564 LT • Downhole to hostile reservoir –
Processing (-40°F to 446°F)
completion tools chemistries
• Industrial
used in water • Excellent compression
injection wells set & thermal shock
resistance
BSV - Deposition/Etch

Dry wafer processing

• Excellent plasma
equipment seals:
resistance
• Bonded slit valve
• Soft material for low
gates -20°C to 232°C
656 Semiconductor sealing forces & –
• Chamber seals (-4°F to 450°F)
tolerance stackups
• Window seals
• High purity, very low
• Gas inlet seals
metallic ion content
• Lid seals

BACK TO TABLE OF CONTENTS

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1684 South Broad Street | PO Box 1307 | Lansdale PA 19446 USA
Phone: +1.215.256-9521 | Fax: +1.215.256.0189 | Toll Free: 1.800.220.4733

Please consult with a Greene Tweed engineer on which compound will best meet the requirements of your application.
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