The processes of ultra-short annealing such as flash lamp annealing (FLA) and laser annealing have the potential to make an important contribution. In the thermal treatment of materials using ultra-short time annealing, high temperatures are applied for very short times (nano to milliseconds), so that only near surface regions of the material are exposed to the maximum temperature, while the majority is not or only moderately heated. These ultra-short annealing technologies have the following advantages over conventional thermal treatments:
• Energy saving, since only regions near the surface are heated
• Process time savings (or higher throughput)
• Use of temperature-sensitive substrates, which are usually cheaper and less harmful to the environment
• Synthesis of new materials in thermal non-equilibrium
The Innovation Lab focuses on FLA technology and focuses with the following fields of application:
